20


nanotimes


Companies Facts


SEMATECH. “This agreement represents a significant achievement for SEMATECH’s EMI consortium, and illustrates our continuing commitment to develop and deliver the infrastructure required for this critical next-generation technology.”


It will be very challenging for state-of-the-art 193nm immersion lithography techniques to pattern chips beyond the 22nm HP technology generation. EUVL, with a wavelength of only 13.5nm, is widely consi- dered the best next technology generation following


deep ultraviolet lithography. The EUV masks used for sub-22 nm patterning must be free of defects to avo- id transferring them onto chip circuits – but current metrology tools are generally ineffective at finding defects below 32 nm node requirements. http://www.sematech.org http://smt.zeiss.com


10-07/08 :: July/August 2010


Advertisement


Page 1  |  Page 2  |  Page 3  |  Page 4  |  Page 5  |  Page 6  |  Page 7  |  Page 8  |  Page 9  |  Page 10  |  Page 11  |  Page 12  |  Page 13  |  Page 14  |  Page 15  |  Page 16  |  Page 17  |  Page 18  |  Page 19  |  Page 20  |  Page 21  |  Page 22  |  Page 23  |  Page 24  |  Page 25  |  Page 26  |  Page 27  |  Page 28  |  Page 29  |  Page 30  |  Page 31  |  Page 32  |  Page 33  |  Page 34  |  Page 35  |  Page 36  |  Page 37  |  Page 38  |  Page 39  |  Page 40  |  Page 41  |  Page 42  |  Page 43  |  Page 44  |  Page 45  |  Page 46  |  Page 47  |  Page 48  |  Page 49  |  Page 50  |  Page 51  |  Page 52  |  Page 53  |  Page 54  |  Page 55  |  Page 56  |  Page 57  |  Page 58  |  Page 59  |  Page 60  |  Page 61  |  Page 62  |  Page 63  |  Page 64  |  Page 65  |  Page 66  |  Page 67  |  Page 68  |  Page 69  |  Page 70  |  Page 71  |  Page 72  |  Page 73  |  Page 74  |  Page 75  |  Page 76  |  Page 77  |  Page 78  |  Page 79  |  Page 80  |  Page 81  |  Page 82  |  Page 83