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10-03 :: March 2010

nanotimes

Companies

Facts

tron-optical column (TFE source) is rated for acce- leration voltages of 20, 50, and 100kV. The system is equipped for true 100kV / 1mm performance under regular electron-optical conditions with a wide current capability for high throughput applications. The pattern generator operates at up to 50MHz. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.

„The acquisition of the Vistec EBPG5000plus will enable the Yale research community to explore the expanding field of nanotechnology with a state-of- the-art electron-beam lithography patterning sy- stem. We will utilize the system for a wide variety of applications including Applied Physics, Electrical Engineering and Bio-technology. The Vistec system will allow Yale to remain at the forefront of nano- technology today and well into the future“, said Dr. Michael Rooks, Facilities Director of the Yale Institute for Nanoscience and Quantum Engineering. „The EBPG system will provide the Yale community with not only high quality nanolithography patterning, but with high flexibility and user friendliness for our various multidisciplinary activities. Vistec’s system is perfect for our nanotechnology requirements.“

„Vistec is pleased to be associated with Yale Univer- sity. We look forward to our co-operation with Yale’s leading edge nanotechnology researchers and their programs“, noted Rainer Schmid, General Manager Vistec Lithography, Inc. „Vistec’s association with Yale and its electron-beam research scientists will hopefully lead to further software and hardware en- hancements for our highly successful EBPG series.“

http://nano.yale.edu http://www.vistec-lithography.com

W

ITec Germany introduces a line extension of the alpha300 microscope series. Building on

the system’s inherent modularity, WITec has added several new microscope versions in order to meet all the diverse and multi-faceted customer requirements one may encounter. In the field of Raman Micro- scopy the new baseline is the micro Raman system alpha300 M for single point spectrum acquisitions and depth profiling. The alpha300 M+ is additi- onally equipped with a stepper motor and allows Raman mapping experiments and large area inve- stigations. The stepper motor can also be attached to the Raman Imaging system alpha300 R, providing an extremely flexible and powerful research tool (alpha300R+) for automated large area and high- resolution 3D chemical imaging.

http://www.witec.de

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