Test & measurement
plane mirrors that are mounted on each linear axis and is suitable for vacuum applications, because the laser head can be mounted outside the vacuum chamber. Song continues: “Renishaw provides us
with cost-effective and high performance position feedback solutions and offers excellent technical support and regular training. The RLE laser encoder delivers nanometre accuracy for our front-end semiconductor process equipment with the additional benefits of easy installation and setup, and short lead times.” VAD tests and calibrates its products prior
to leaving the factory using Renishaw’s XL-80 laser system for machine calibration and quality control. These systems are fast, extremely accurate with linear measurement accuracies of ±0.5 ppm, lightweight and portable.
Results
according to the accuracy requirements. VAD President Baek-Kyun Song explains:
“Our general platform models are equipped with RTLC series steel tape scales. If advanced vacuum applications are involved, such as display panel AOI inspection equipment or semiconductor process equipment, we will specify the higher precision RELM scales. The scale is read by a vacuum-compatible TONiC readhead and is connected to an interface outside the vacuum chamber. There are many high-quality encoder products on the market, but few are also compatible with vacuum applications. Renishaw’s TONiC UHV encoder delivers both excellent performance and reliability, it is our best choice.” Renishaw’s TONiC UHV encoder, from the
cable, to the readhead, to the scale, has been designed for vacuum pressures under 10-9 mbar. The TONiC UHV readhead is equipped with an RFI shielded cable, and its basic working principle, specifications and performance are the same as for the standard TONiC model. The encoder is made from cleanroom and vacuum-compatible materials and is designed to enable full evacuation of the readhead body. TONiC UHV readheads and scales have also been certified by an independent test agency using residual gas analysis (RGA) data collected on a quadrupole mass spectrometer. Specialised sealed foil packaging ensures that each TONiC UHV encoder arrives at the customer in clean room condition. The TONiC encoder series
offers a diverse range of readhead options, which can be matched with a variety of compatible scales. Song
Instrumentation Monthly February 2021 57
explains VAD’s criteria for selecting encoder scales: “Some of our high-end models use high accuracy RELM spar scale, which has near-zero thermal expansion, to ensure that positioning accuracy is maintained in environments with large temperature differences. “For instance, temperatures inside a vacuum
chamber can often vary by as much as 100°C from one side to the other. Renishaw’s encoder products have a good reputation in the marketplace; the TONiC encoder series is often seen in applications with high- performance equipment and has been widely recognized by the industry. In addition, Renishaw’s after-sales service is excellent and includes regular product bulletins. For us, the most important thing is that the delivery is punctual so that we don’t lose customers due to long waits for parts.” For nanometre-level precision, VAD employs
Renishaw’s RLE laser encoder system for the position feedback control of an XY stage designed for semiconductor mask inspection by extreme ultra-violet light. The RLE system uses
Renishaw’s TONiC encoder series, RLE laser encoder system and XL-80 laser interferometer system are combined to give VAD an advanced integrated metrology solution for its motion platforms. In vacuum applications, the TONiC
UHV encoder with 20 µm-pitch RELM (ZeroMet) scale delivers an absolute accuracy of ±1 µm per metre and features a coefficient of thermal expansion of just 0.75 ±0.35 µm/m/°C (at 20°C). The scale can be installed with either self-adhesive backing tape or by mechanical means to avoid adhesive degassing under vacuum. The RLE laser encoder features
exceptional resolutions down to 38.6 picometres and a system non-linearity error (SDE) as low as ±1 nm. Song concludes: “We are optimistic about
the future market demand for vacuum application equipment; especially precision industrial process equipment in FPD and semiconductor manufacturing. At present, VAD is developing related process platforms for these applications.”
Renishaw
www.renishaw.com/tonic
Page 1 |
Page 2 |
Page 3 |
Page 4 |
Page 5 |
Page 6 |
Page 7 |
Page 8 |
Page 9 |
Page 10 |
Page 11 |
Page 12 |
Page 13 |
Page 14 |
Page 15 |
Page 16 |
Page 17 |
Page 18 |
Page 19 |
Page 20 |
Page 21 |
Page 22 |
Page 23 |
Page 24 |
Page 25 |
Page 26 |
Page 27 |
Page 28 |
Page 29 |
Page 30 |
Page 31 |
Page 32 |
Page 33 |
Page 34 |
Page 35 |
Page 36 |
Page 37 |
Page 38 |
Page 39 |
Page 40 |
Page 41 |
Page 42 |
Page 43 |
Page 44 |
Page 45 |
Page 46 |
Page 47 |
Page 48 |
Page 49 |
Page 50 |
Page 51 |
Page 52 |
Page 53 |
Page 54 |
Page 55 |
Page 56 |
Page 57 |
Page 58 |
Page 59 |
Page 60 |
Page 61 |
Page 62 |
Page 63 |
Page 64 |
Page 65 |
Page 66 |
Page 67 |
Page 68 |
Page 69 |
Page 70 |
Page 71 |
Page 72 |
Page 73 |
Page 74