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nanotimes
Companies Facts
M
olecular Imprints, Inc. introduced the Perfecta MR5000 – its new Jet and Flash™ Imprint Litho-
graphy (J-FIL™) imprint mask replication platform for the semiconductor industry. Representing the industry’s first nanopatterning system specifically de- signed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks to be fabricated from a single e-beam master, substanti- ally reducing mask costs, an important component in delivering low cost of ownership for imprint’s use in advanced non-volatile memory architectures.
Molecular Imprints is also pleased to announce that Dai Nippon Printing Co., Ltd. (DNP), the leading merchant supplier of masks to the semiconductor in- dustry, has taken delivery of the first MR5000 system, furthering the close and continuing collaboration between the two companies in the development of nanoimprint masks for semiconductor manufacturing at 2Xnm and beyond.
Perfecta MR5000 represents a significant advance- ment in nanopatterning technology. Taking e-beam written leading-edge 6025 “master” masks, the system is capable of transferring the patterns flaw- lessly onto 6025 replicas that can be accepted by a manufacturing wafer imprint lithography system. Featuring the company’s enhanced IntelliJet™ Drop Pattern Generator technology, the Perfecta MR5000 dispenses picoliter resist droplets mapped to local feature density, enabling excellent residual layer thickness (RLT) uniformity for pattern transfer fide- lity of 2Xnm features, while virtually eliminating the need for resist waste disposal.
Molecular Imprints, Inc. (MII) is a technology leader for high-resolution, low cost-of-ownership nanoim-
print lithography systems. MII is leveraging its inno- vative Jet and Flash™ Imprint Lithography (J-FIL™) technology with IntelliJet™ material application.
http://www.molecularimprints.com
N
anoFocus AG (N2F, a German specialist for optical 3D surface measurement technology)
completed fiscal year 2010 with a turnover of EUR 6.5 million and an EBITDA of EUR687,000. Nano- Focus could therefore reach the level of the pre-crisis year 2008 despite a difficult market environment in fiscal year 2010. The order intake and turnover picked up in the second half of 2010, even more so in the fourth quarter.
The capital increase in FY 2010 improved the equity- to-assets ratio once again. The ratio as of end of December 2010 was 71.8% and increased by 1.7% compared to previous year with 70.1%.
Outlook The on-going financial year confirms the positive trend from last year. The demand and turnover are on the rise. The relevant industry investment budgets are allocated bit by bit. Therefore, NanoFocus ex- pects a considerable sales increase and consequently a positive annual result for 2011.
In addition, the new generation of the µsurf solar measurement system by NanoFocus has won the in- ternationally coveted Intersolar Award in the category PV Production Technology. The business solution for the solar industry was awarded for enabling optimal quality assurance in the production and research of solar cells. The Intersolar Award honors ground- breaking products and services by companies and
11-05 :: May/June 2011
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