Previous Page
40
nanotimes
Companies Facts
V
eeco Instruments Inc. (NASDAQ: VECO) announced its financial results for the first
quarter ended March 31, 2012. Veeco‘s second quarter 2012 revenue is currently forecasted to be between $120 million and $145 million. Earnings per share are currently forecasted to be between $0.20 to $0.40 on a GAAP basis, and $0.29 to $0.48 on a non-GAAP basis. Please refer to the attached financi- al table for more details.
Moreover, Veeco Instruments announced that Ed- ward H. Braun, formerly Chairman of the Board, has transitioned his Chairman role to John R. Peeler, Chief Executive Officer. Mr. Peeler will now hold the title of Chairman and Chief Executive Officer. Mr. Braun will remain an active member of Veeco’s Board of Directors.
nounced that the noted Institute of Electronic Mate- rials Technology (ITME) in Warsaw purchased a Variable Shaped Beam system SB251 from Vistec. The advanced lithography tool will be used for re- search and manufacturing of various kinds of micro- optical and diffractive elements, new materials as well as masks for optical lithography.
V
As a leading research institute in Poland, ITME is working in the multidisciplinary area of research, development and manufacturing of materials, inno- vative devices and components for application in electronics, micromechanics and optoelectronics.
istec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, an-
“We selected Vistec‘s electron-beam writer to sup- port our research, development and manufacturing efforts due to its high performance and flexibility. We anticipate that the new Vistec SB251 will significant- ly contribute to successfully meet our research and development agenda,” said Dr. Zygmunt Luczynski, director of ITME. The decision was made as a result of a European tendering procedure.
The Vistec SB251 is a universal system, which has been designed for both direct write as well as mask making exposures. The system is capable of handling and exposing transparent & non-transparent materi- als, which are in use in semiconductor and optics ap- plications. Equipped with a 50kV electron optics, an address grid of 1nm and an exposure platform with a stage travel range of 210mm x 210mm the system enables lithography below 50nm on various sub- strates from pieces up to 200mm wafers and 7inch masks. A Graphical User Interface (GUI) and fully automated cassette-to-cassette substrate handling allow the effective usage in a diverse, multiuser envi- ronment at Institutes like ITME. Furthermore the sy- stem features the data preparation software package ePLACE (provided by EQUIcon GmbH).
http://www.itme.edu.pl http://www.vistec-semi.com
R
esearchers at Northwestern University‘s Depart- ment of Radiation Oncology and the Argonne
National Laboratory recently deployed a new non- destructive X-ray microscopy solution from Xradia to image cryogenically preserved cells and advance
12-04 :: April/May 2012