ting & sales strategy.” Further steps are organizing regular workshops, being present at trade shows and having an individual customer support.“
As part of this, Vistec had organized a workshop, in partnership with one of its Beijing based customers NCNST, who has enthusiastically agreed to act as host, before this year’s ChinaNANO 2011 confe- rence, on September 6th, 2011.
“This was an important step towards informing the Chinese market of what electron-beam lithography has to offer for leading edge technology centres such as NCNST,” reflects Stolberg.
At the workshop Vistec has been pleased to welcome experts in their field like Prof. Chen Baoqin, IMECAS, Dr. Peter Hahmann and Dr. Ralf Steingrueber, Fraunhofer HHI, who gave technology presentations in both electron-beam technology in general and the use of such systems for the development of new de- vices for various applications. More than 40 scientists from leading edge research institutes and universities/ Centers of excellence from throughout China atten- ded the workshop.
At the ChinaNANO 2011 Vistec focused on its EBPG5200 Series and EBPG5000 Series systems. These systems have evolved over many years with considerable input and feedback from Vistec’s exten- sive worldwide customer base and fulfil the needs of tomorrows required accuracy and resolution along with flexibility for a wide range of applications. Vistec is also a manufacturer of high throughput Variable Shaped Beam systems for industrial mask and direct write manufacturing.
11-08 :: August 2011
© Vistec Electron Beam Lithography Group
“Overall we see our self very well placed to meet the needs of the fast moving Chinese market for both Re- search & Development as well as industrial applica- tions,” explains Stolberg. “We are pleased to discuss this in more detail at the ChinaNANO 2011 by our team of experts present.”
ITec has just received the prestigious Micros- copy Today Innovation Award for the deve-
lopment of True Surface Microscopy. Each year, the well-respected Microscopy Today magazine selects the best new development in microscopy and pre-