WOMEN IN OPTICS


abandon the technology that has been developed since the industrial revolution, more than 200 years ago. Renewable energy, smart cities, green transportation, energy efficiency – all rely on semiconductors. Photomasks with high yield and lower cost is the base of lithography in semiconductor manufacturing. Developing, to indulge a personal example, EUV pellicles to increase the yield of sub-7nm node wafers helps to enable advanced-node semiconductor manufacturing. Both Samsung and TSMC have EUV lithography- based N7 offerings that give gains in performance and reduction in power over the DUV-only process flows3


. Returning to the concept of


yields, improving yield – reducing waste – reduces our impact on the planet. Innovation will be needed to propel human activity while minimising reliance on fossil fuels. For long-term fab planning, climate change must factor into building locations and workplace


“Decisions should be made with climate change in mind.Metrics related to sustainability and environmental impact should be developed and used whenever possible”


practices. Investment decisions should be made with climate change in mind. Metrics related to sustainability and environmental impact should be developed and used whenever possible. Change is essential to address


climate stress and it needs to be quick and global. Political change is neither fast nor guaranteed to cross international borders. Successful companies offer a lever for change as Bill McKibben of 350.org describes in another September 2019 New Yorker article (title: ‘Money Is the oxygen on which the fire of global warming burns’)4


. Individuals


and the private sector will have to support difficult decisions related to climate at the city, state and national levels. We can choose to be responsible world citizens, making informed choices in all aspects of life – photomasks and all. EO


www.electrooptics.com | @electrooptics


SPC-150NXX : Highest Timing Accuracy 


 23  1


 Improved Resolution for Ultra-Fast Detectors


  


  


  


 


S Single Photon Counting 


       


This editorial, written by Imec’s principal member of technical staff Emily Gallagher, originally ran in the February 2020 issue of BACUS News.


BACUS is the international technical group of SPIE, the international society for optics and photonics, dedicated to the advancement of photomask technology.


Gallagher earned her PhD in physics studying free electron lasers at Dartmouth School of Graduate and Advanced Studies. She then shifted to IBM and the semiconductor industry, where her work ranged from electrical wafer characteri- sation to lithography. She led the EUV photomask development for IBM before joining Imec in 2014. She has collaborated on over 100 technical papers, holds more than 30 patents, and is an SPIE Fellow.


References 1.


new-yorker 3.


www.newyorker.com/culture/cultural-comment/what-if-we-stopped-pretending 2. www.vox.com/future-perfect/2019/9/11/20857956/jonathanfranzen-climate-change-


https://en.wikichip.org/wiki/7_nm_lithography_process


4. www.newyorker.com/news/daily-comment/money-is-the-oxygen-on-which-the-fire-of- global-warming-burns


We have... the technology


 


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