12-02 :: February/March 2012

nanotimes News in Brief

“The dream tip material for thermomechanical na- nofabrication should have a high hardness, tempe- rature stability, chemical inertness, and high thermal conductivity,” said Dr. Mark Lantz, manager in storage research at IBM Research - Zurich. “With this novel tip we continue to deliver on IBM‘s vision of a smarter, instrumented world with microscopic sensors monitoring everything from water pollution to patient care.”

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Researchers at the Georgia Institute of Technology, USA, have doubled the rate that heat travels from a solid surface into the liquid in the pot. “Delaying the critical flux could play an important role in advancing thermal management of electro- nics as well as improving the efficiency of a number of energy systems,” says Bo Feng, the Georgia Tech researcher leading this project.

Bo Feng, Keith Weaver, G. P. Peterson. Enhancement of critical heat flux in pool boiling using atomic layer deposition of alumina, In: Applied Physics Letters, Vol. 100(2012), Issue 5, Article 053120 [3 pages], DOI:10.1063/1.3681943: http://dx.doi.org/10.1063/1.3681943

Mark A. Lantz, Bernd Gotsmann, Papot Jaroenapibal, Te- vis D. B. Jacobs, Sean D. O‘Connor, Kumar Sridharan, Robert W. Carpick: Wear-Resistant Nanoscale Silicon Carbide Tips for Scanning Probe Applications, In: Advan- ced Functional Materials Early View, February 08, 2012, DOI:10.1002/adfm.201102383: http://dx.doi.org/10.1002/adfm.201102383

Researchers at Hokkaido University, Japan, and PRESTO, Japan Science and Technology Agency, report an innovative lithography system appropri- ate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photo-lithography. The key technology based on two-photon photochemical reactions of a photore- sist induced by plasmonic near-field light and the scattering component of the light in a photoresist film.

Kosei Ueno, Satoaki Takabatake, Ko Onishi, Hiroko Itoh, Yoshiaki Nishijima, and Hiroaki Misawa: Homogeneous nano-patterning using plasmon-assisted photolithogra- phy, In: Applied Physics Letters, Vol. 99(2012), Issue 1, Article 011107 [3 pages], DOI:10.1063/1.3606505: http://dx.doi.org/10.1063/1.3606505