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Does a
VISTEC EBPG5200
help me to keep on
track of my challenging
research roadmap?*
Piet Kaars
Engineering Manager EPBG Series
* Yes, absolutely!
Lithography below 8nm, exposure capabiltity from small fragments to complete 200mm substrates, high
position accuracy and perfect long term stability in combination with a user friendly operation gives you the
fl exibility you need today and in the future. A team of well-experienced lithography engineers are continuously
working on further improvement of the system to make it even more valuable for our customers.
Your Dedicated Performance Partner
for Electron Beam Lithography
Vistec Electron Beam Lithography Group I www.vistec-semi.com
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