Evactron® The Evactron®


Zephyr™


Plasma Decontaminators Zephyr Decontaminator line was created to accommodate SEMs,


FIBs, and other vacuum chambers that use turbo molecular pumps. They are designed for SEM/FIB systems and offer fast and efficient hydrocarbon removal with no damage to samples or sensitive components. They offer users:


• Cleaning of SEM/FIB chambers at turbo pressure • Shorter cleaning time (increased production, less downtime) • One button operation


Evactron® Model 25 Zephyr Plasma Decontaminator


• Desktop controller • SEM/FIB chambers or load locks


• 2 operating regimes Classic mode (roughing pressures) T-pump mode (turbomolecular pressures)


This easy to use tabletop model easily removes atmospheric hydrocarbons and carbon contamination from SEMs, FIBs, and other vacuum chambers.


The Evactron® Model 25 Zephyr


Decontaminator uses a remote RF plasma to produce gas-phase radicals that flow downstream through the chamber eliminating contamination.


This model was created for chambers that use turbo molecular pumps (TMPs). It is designed to clean/de-contaminate in the turbo pressure regime at 1-50 mTorr and has no adverse effects on the TMP temperatures.


Ordering Information Cat. No.


91000-10


Description Evactron®


25 Zephyr Plasma Decontaminator


with PRS-V, Vertical Plasma Radical, Source with shroud, Desktop controller and cable set


Features • Clean chambers at turbo pump pressures


• 5-20 Watts RF power • ≥10x improved cleaning rate • One button operation • 1-50 mTorr operating pressure


Benefits • No stress to the turbo molecular pump


• Safely de-contaminates the chamber without damage to sensitive components


• Shorter cleaning time, giving increased production with less system down time


• Cleans chamber while in “pump down”


• Increased mean free path, yet ion damage free


Qty. each


Evactron®


SoftClean™


Features • Windows and Android GUI software


• Optional Safar side loaders (US 8,716,676 B2)


• Accommodates up to three TEM stage rods


The Evactron® SoftClean Chamber


extends the ability to pre-clean specimens, specimen mounts, and holders with the proven downstream plasma ashing process before examination in the chamber, thus insuring high image quality. The Evactron®


SoftClean Chamber can


also be used as a specimen storage system, keeping samples in a clean environment.


The downstream plasma process used in the Evactron®


SoftClean


Chamber is gentle, yet very effective at removing H/C contamination. Sputter etching by other plasma cleaners can damage specimens through exposure to energetic ions and heat.


The Evactron® SoftClean Chamber


uses reactive gas radicals to remove H/C from specimen surfaces by chemical etch, preserving critical sample fine structure. This


Ordering Information Cat. No.


91000-15


Description Evactron®


SoftClean EP


System


downstream etching process breaks down problematic H/C residues into


smaller molecules such as CO2, H2O and CO, which are easily pumped out of the chamber.


Specifications Cleans SEM/TEM samples Cleans TEM grids/sample rods Inert sample storage Just use air for oxygen radicals, or use other gases for alternative plasma processes Easy setup and operation. Preset pressure, power and time settings Can be operated from either front panel or computer interface Optional shroud can cover transducer and valve assembly on the Plasma Radical Source Start cleaning by using chamber vent and evacuation controls Advanced plasma detection logic Cleaning and error logs record history and aid troubleshooting Electronic Chassis: 3.5"H x 19"W x 7"D (9 x 23 x 48 cm) RF Power: 5-20 Watts at 13.56 MHz KF 40 vacuum mounting flange, adapter flanges available 90-250 VAC 50/60 Hz input Shipping: 20 lb. (10 kg.)


Qty. each


Cat No.


Description


230003-01 JEOL, 86 X 206, NO O-RING, 4H ASYM 230010-01 JEOL, 73 OD, 50 ORID, 64 BC, 4H 230011-01 JEOL, 74 X 90, OVAL O-RING, 4H, ASYM


230013-01 JEOL, 88 OD, 45 ORID,79 BC, 4H, ASYM, 90 LONG NIPPLE 230022-01 JEOL, 100 X 355, NO O-RING, 5H, ASYM 230023-01 JEOL, 72 X 86, OVAL O-RING, 4H, ASYM 230311-01 JEOL, 88 OD, 45 ORID, 79 BC, 4H, ASYM


230322-01 JEOL, 75 X 98 (ARCHED ON ONE SIDE), OVAL O-RING, 4H, ASYM 230325-01 JEOL, 154 X 204, RECT O-RING, 4H, ASYM 230664-01 JEOL, 95 OD, 71.5 ORID, 85.5 BC, 3H 230008-01 ZEISS, 55 OD, 30 ORID, 45 BC, 4H 230012-01 ZEISS, 64 X 64, 54 ORID, 57 BC, 4H 230014-01 ZEISS, 79 OD, 53 ORID, 70.5 BC 4H 230015-01 ZEISS, 84 OD, 54 ORID, 72 BC, 4H


Qty.


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Cat No.


Description


230016-01 ZEISS, 70 OD, 45 ORID, 57 BC, 4H 230017-01 ZEISS, 113.5 OD, 46.5 ORID, 92 BC, 4H 230018-01 ZEISS, 64 OD, 38 ORID, 57 BC, 4H 230020-01 ZEISS, 82 OD, 41 ORID, 68 BC, 4H, PLUG 230034-01 ZEISS, 96 OD, 72 ORID, 86 BC, 4H, ASYM 230036-01 ZEISS, 62 X 62, 53 ORID, 71 BC, 4H 230037-01 ZEISS, 162 OD, 127 ORID, 149 BC, 6H 230038-01 ZEISS, 68 X 88, OVAL O-RING, 4H, SYMM 230039-01 ZEISS, 89 X 89, 72 ORID, 92 BC, 4H 230356-01 ZEISS, 100 OD, 60 ORID, 90 BC, 6H 230357-01 ZEISS, 90 OD, 66 ORID, 81 BC, 4H, ASYM 230358-01 ZEISS, 81 X 85, 4H, ASYM


230364-01 ZEISS, 85 x 85, 70 ORID, 92 BC, 4H 230366-01 ZEISS, 150 X 190, RECTANGULAR O-RING, 10H, ASYM


Qty.


each each each each each each each each each each each each each each


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