Tech Front
are using energetic jets of inert argon gas to clean substrate surfaces and carefully tune the energy of the desired mol- ecules delivered in another jet to enhance the rate at which the precursor sticks to the substrate.
“If the energy of the jet is sufficiently high, the inert gas molecules striking the surface can knock away the adsorbed hydrocarbon contamination so that there is no parasitic car- bon co-deposition,” he said. “We can also tune the properties of the precursor molecules so they stick more effectively to the surface. We have shown that we can increase the rate of growth by an order of magnitude or more while maintaining a high aspect ratio of deposited nanostructures.” To date, about two dozen materials have been success- fully deposited using FEBID on different substrates, including semiconductors, dielectrics, metals and even plastics. The researchers aim to create nanostructures containing more than one material, allowing them to create unique properties not available in each individual material.
Georgia Tech doctoral candidate Matthew Henry and professor Andrei Fedorov (right) set up the precursor jet micro-nozzle inside a FEBID vacuum deposition chamber.
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ManufacturingEngineeringMedia.com | December 2013
Photo courtesy Rob Felt, Georgia Tech
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