INDUSTRY RESEARCH
CNST NanoFab Process Engineer Liya Yu anticipates that the ability to fabricate high aspect-ratio grayscale nanostructures will expand the practical applications of grayscale lithography and dramatically widen the range of device structures available to device designers. This work is described further in the paper, “The evaluation of photo/e-beam complementary grayscale lithography for high topography 3D structure,” by L. Yu et al in the Proceedings of SPIE 8682, 868212 (2013).
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Issue IV 2013
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