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Air Water to develop GaN-on- SiC-on- silicon with Aixtron reactor


The company is building on large diameter SiC on silicon technology for LEDs and power devices


Air Water of Azumino in Japan has reported the successful installation of a fully automated Aixtron AIX G5 HT planetary reactor in an 8 x 6 inch configuration for the growth of GaN epitaxial layers.


power electronic applications.


Shimadzu unveils compact turbo molecular vacuum pumps


The new series of pumps, which could be used in the MOCVD growth of III-V materials, should enable cost reductions


Aixtron AIX G5 HT planetary reactor


Aixtron says Air Water selected this MOCVD system to deliver superior material uniformity, a key factor in demonstrating the advantage of Air Water substrates for GaN epitaxy.　


Following the installation, the company has announced the release of GaN-on-SiC on silicon substrates for this year.


In order to address future market demand, Air Water is also considering upgrading the system to an Aixtron AIX G5+, which can handle up to 5 x 200 mm (8 inch) silicon substrates.


As compared to traditional silicon substrates, the additional SiC layer displays the advantage of protecting the silicon substrate in the initial GaN nucleation process. Due to its crystal structure SiC is considered as an ideal template for the GaN growth.


So, the SiC-on-silicon substrate is enabling the growth of superior crystal quality GaN layers onto large areas. This characteristic brings efficiency and cost savings to a wide range of high-power and LED applications.


Air Water is a Japanese industrial gas manufacturer and has developed SiC growth on silicon for both power device and LED applications as part of the semiconductor gas business.


The company has already succeeded in the production of high quality 3C-SiC (111) on up to 8 inch silicon substrates and has also announced the release of these products for GaN epitaxial growth required to manufacture electronic devices for LED and


On 2nd September 2013, Shimadzu Corporation will launch the company’s new “TMP-X2905/X3405” series of turbo molecular pumps.


With integrated power supplies and 3000 L/s class pumping speeds for semiconductor and flat panel display manufactures, the Turbo molecular pumps (TMPs) produce a vacuum due to the high speed rotation of turbines that enables vacuum pumping at the molecular flow level.


TMPs are essential in applications where oil free, clean and high vacuums are essential.


The versatile pumps are compact and feature integrated power supplies for installation in both light and hard processes.


Shimadzu positions TMP as global strategic products in its product portfolio and will expand sales of the TMP-X series to North America, Taiwan, Korea, and China.


Following the recent fall in the price of electronics equipment incorporating semiconductor devices and flat panel displays, there are growing demands for innovative methods to reduce the costs of semiconductor and flat panel display manufacturing equipment.


Regarding turbo molecular pumps attached to manufacturing equipment, there are growing needs for a move away from pumps where power supplies are connected with separate cables, to pumps where the power supplies are integrated into the body of the TMP itself.


August/September 2013 www.compoundsemiconductor.net 145


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