PRODUCT UPDATE
LEDS AND ILLUMINATION
LENSES AND OPTICS
Quantum X maskless lithography system The Nanoscribe Quantum X targets specific needs in modern industrial microfabrication. Within its compact housing, prototypes of refractive and diffractive micro-optics, in addition to polymer masters, can be product produced. The system features an industrial form factor with automated processes, and intuitive and ready-to-use interfaces for process control.
Soft X-Ray (SXR) light source
The 642-1 Soft X-Ray (SXR) light source from McPherson features a six position anode carousel. Users can easily change anode target materials without breaking vacuum.
Using different anode materials allows tuning of the emitted eV energy. The vacuum housing of the source features standard NW40K vacuum flanges (optionally DN40CF). It also features two equivalent output beams. These provide ability for sample/reference comparison and device calibration. The new source is easy to set up and
provides reliable emission-line source and means for at-wavelength calibration, or metrology of SXR lithography materials, multilayers or grazing incidence optical systems for astrophysics and other fundamental research. This electron impact light source uses a hot filament to produce electrons, that are subsequently accelerated towards a solid anode target by high voltage. The SXR and extreme UV output emission spectrum follows the target anode material valence band structure. Anodes can be readily exchanged in the carousel to produce desired wavelengths, such as Si (0.71nm), Mg (0.98nm), C (4.4nm) and many more.
www.mcphersoninc.com
Quantum X is the first industrial system based on two-photon grayscale lithography (2GL). The key to this technology is laser power modulation and dynamic focus positioning, synchronised accurately at high scanning speeds. Using this smart approach, a full control over the voxel size is achieved along each scanning plane. Without compromising speed, precision components materialize with excellent shape accuracy and ultra-smooth surfaces. This lithography system features smart solutions. Equipped with automatic objective and sample holder recognition, as well as resin dispensing, the system facilitates the sample preparation and changeover between hardware configurations, speeding up the complete
Techspec Ultrafast harmonic separators and Techspec λ/40 aspheric lenses
Edmund Optics has launched Techspec ultrafast harmonic separators and Techspec λ/40 aspheric lenses. The Techspec ultrafast harmonic
separators, also known as ultrafast harmonic beamsplitters, reflect second or third harmonic wavelengths from femtosecond lasers and transmit the fundmental pulse. The reflective surface is designed to be highly reflective and to minimise dispersion with a GDD of ±20 fs2, while the back surface is coated with an anti- reflection coating to maximise transmission. Manufactured from low wavefront distortion, 10-5
surface quality fused silica substrates,
Techspec ultrafast harmonic separators are available in two designs for separating harmonics of 800nm or 1,030nm lasers. The Techspec λ/40 aspheric lenses
feature a high numerical aperture design and a aspheric figure error ofλ/40 or better, achieved via precision magnetorheological finishing.
These aspheres are also available coated
for specific Nd:YAG laser wavelengths as the Techspec λ/40 laser grade aspheric lenses. Each Techspec λ/40 aspheric lens is individually measured individually for 3D surface profile and test data is provided for each lens.
www.edmundoptics.eu
workflow. A software wizard guides designers and engineers through print job creation from the very beginning, simplifying job preparation. Moreover, the software controls and monitors print jobs in real time and supports intuitive operation. For example, users can now check on the job status, adjust process controls and visualise printing in real time, directly on the built-in touchscreen. Three live-view cameras monitor the printing process.
www.nanoscribe.com
ANALYSIS, TEST AND MEASUREMENT
BWA-CAM 20/20 beam waist analyser
New to Laser Components’ range of beam analysis equipment is the BWA-CAM 20/20. Much like the existing beam
waist analyser (BWA) products, the system allows real-time laser beam analysis and ISO compliant measurement of M2 and other spatial metrics.
The BWA-CAM 20/20 is a
plug-and-play solution offering ISO compliant real-time M2 measurement, with no complex alignment needed for high power CW and pulsed lasers. The user simply centres the
system such that it is roughly perpendicular to the beam, enters the laser wavelength, effective focal length of the lens
34 Electro Optics August/September 2019
being used and the distance from the lens to the front of the BWA-CAM 20/20, and the real time measurement is ready. The M2 measurement is made in a fraction of a second and takes no more effort or training than measuring laser power, for example. The BWA-CAM 20/20 is available now.
www.lasercomponents.com/uk/
@electrooptics |
www.electrooptics.com
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