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Companies Facts

to $17.3 million for 2010. Royalty and license fees for 2011 were $15.3 million, up 233% compared to $4.6 million for 2010. Technology development and support revenue was $8.5 million for 2011, down slightly compared to $8.7 million for 2010.

Universal Display licenses its proprietary technolo- gies, including its breakthrough high-efficiency Uni- versalPHOLED®

phosphorescent OLED technology, http://www.universaldisplay.com

(NASDAQ: VECO) introduced the SPECTOR-HT™ Ion Beam Deposition (IBD) System. Used to create thin film coatings for the optical market, the SPEC- TOR-HTE™ provides up to 400% increase in through- put, 300% increase in target utilization and 50% improvement in material uniformity compared to previous SPECTOR generations.

A

t the SPIE Photonics Europe Trade Show in Brussels, Belgium, Veeco Instruments Inc.

V

istec Lithography Inc. announced that Micronova Nanofabrication Centre, Finland, has selected

one of its electron-beam lithography systems, Vistec‘s EBPG5000plusES. The leading nanotechnology labo- ratory in Finland aims to use for the design, develop- ment and fabrication of micro- and nanosystems. The cutting edge technology is specialized for multi-user environments and is therefore a future-proof match to the needs of Micronova.

“This state-of-the-art electron-beam lithography sys- tem gives us the possibility to continue future-proof research at the very highest level. But not only the characteristics of the system determined our decision also the long term experience of Vistec in this field of research were decisive,” comments Dr. Veli-Matti Airaksinen, director of Aalto Nanofab at Micronova, the acquisition of the new system.

The Vistec EBPG5000pES is a high-performance litho- graphy tool based on reliable and well-proven system architecture. The system is equipped for true 100kV/ 1mm performance under regular electron-optical conditions with a wide capability for high throughput applications. Rainer Schmid, General Manager Vistec Lithography, Inc., explains further characteri- stics: “Its electron-optical column, rated for accele- ration voltages of 50 and 100kV, enables the EBP- G5000pES to provide a spot size down to <2.2nm. On the other hand nano-lithography structures smaller than 8nm can easily be generated.”

http://www.veeco.com/spectorht

Furthermore the system incorporates an interactive graphical user interface (GUI). “With this feature we enable the use for diverse, multiuser environments such as used at huge research institutes like Microno- va or universities.”

12-03 :: March/April 2012