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JUSUNG to supply MRAM etching equipment to Crocus

JUSUNG ENGINEERING is to supply an integrated etch and deposition system for advanced MRAM technology to Crocus Nano Electronics (CNE).

Russian Based CNE is a joint venture founded by Crocus Technology, an MRAM semiconductor developer, and RUSNANO, a Russian state-owned international investment company. The supply agreement has a significant meaning to JUSUNG’s global expansion strategy as the process technology was validated by Crocus Technology in the USA.

The Genaon Plus MRAM etching equipment to be supplied by JUSUNG is a core process tool that can etch non-volatile materials such as platinum, manganese and cobalt.

Conventional process tools cannot process such new materials that are used in advanced memory devices, making JUSUNG’s Genaon Plus a unique enabling technology.

According to JUSUNG, the plasma etching equipment specialized for magnetic metal layers patterning, one of the most critical in MRAM processes, can completely eliminate polymer residue

left behind on the side walls during the etching process, thereby enabling chip designers to utilise a variety of new materials.

As a low-power, high-density memory chip that combines storage capacity of flash memory and high speed of DRAM, MRAM is emerging as a next-generation memory. The MRAM market is engaging rapidly and is expected to grow to 925 billion Korean Won in 2018 globally.

JUSUNG is excited to participate at the early stage of such a high growth market. CJ Hwang, CEO of JUSUNG, comments, “We identified Crocus Technology as an ideal partner to launch our next- generation equipment. Crocus is an industry leader in the emerging market. While this is a new partnership for JUSUNG, our goal is unchanged to develop innovative technologies to delight our customers.”

Boris Omarov, CEO of CROCUS NANO ELECTRONICS, adds, “We made the critical decision for CNE because Jusung is the leader in Magnetic Etch Technology. Jusung is the perfect partner for CNE and Russia, since they all share the same spirit of pacesetting and dedication to perfection.”

ARM acquires Cadence display tech

ARM, A SEMICONDUCTOR IP supplier, and Cadence Design Systems, Inc. an innovator in global electronic design, have signed a definitive agreement for the sale and transfer of Cadence PANTA display controller cores to ARM. The agreement enhances the companies’ long-standing ecosystem collaboration and strengthens their technical alignment. Cadence’s PANTA family of high-resolution display processor and scaling coprocessor IP cores was co-developed in conjunction with ARM and is targeted at advanced multimedia applications for high-end mobile devices with ultra-low power consumption. “Display technology is critical to the mobile consumer’s user experience,” says Pete Hutton, executive vice president and general manager, Media

Processing Division, ARM. “The addition of the PANTA family of display cores to the ARM product portfolio will help our ecosystem of partners get to market quickly with high-end displays that are fully integrated with ARM’s leading Mali graphics and video solutions and protected with ARM TrustZone security.”

Martin Lund, senior vice president of Cadence’s IP Group, adds, “ARM and Cadence work together closely on many levels, including IP integration, verification IP (VIP) for all ARM AMBA protocols, and high-performance design solutions optimised for ARM cores.

As a result, both companies offer more tightly integrated solutions to our mutual customers.”

8 Issue IV 2013

Cabot achieves multiple orders for logic devices

CABOT MICROELECTRONICS has announced that its “Novus A7100 Aluminum” CMP slurry products have been adopted by several customers to help enable 28/20 nanometre High-K Metal Gate integration schemes used for advanced logic devices. The Novus A7100 Aluminum slurry product platform is the result of Cabot Microelectronics’ CMP technology and extensive research and development in close collaboration with strategic customers.

Novus A7100 contains a combination of unique engineered abrasive particles and proprietary chemistry to remove aluminium and the complex stack of work-function metals within the transistor gates of advanced semiconductor logic devices. This CMP solution was designed to polish aluminium and then stop on the underlying dielectric material and therefore minimise dielectric material erosion and aluminium recess. Novus A7100 is formulated to optimise removal rate, limit erosion and recess, and meet low defect requirements.

Charles Chen, Cabot

Microelectronics’ Global Business Director, states, “The Novus A7100 Aluminum CMP slurry provides our customers with a solution for a critical process step in enabling High-K Metal Gate device integration at advanced technology nodes. We believe the extremely low recess levels that can be achieved across a wide range of feature sizes and densities, results in better device reliability and transistor performance.”

Cabot Microelectronics Corporation, is a supplier of CMP polishing slurries and a growing CMP pad supplier to the semiconductor industry. The company’s products play a critical role in the production of advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers.

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