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SÜSS MicroTec and Rolith Cooperate on Nanolithography Technology


The firms anticipate the technology will enable the next generation of advanced products, such as high efficiency 3D solar cells, and building-integrated PVs.


SÜSS MicroTec, a leading supplier of equipment and process solution for the semiconductor industry and related markets, has entered into a joint development and exclusive license agreement with Rolith.


The two firms will develop and build nanostructuring equipment employing a disruptive nanolithography method developed by Rolith. Availability of a high throughput cost effective technique for nanostructuring over large areas of substrate materials brings new possibilities to renewable energy and green building markets.


Rolith’s patent pending nanolithography technology is based on a proprietary implementation of near-field optical lithography using cylindrically shaped rolling masks. Sub-wavelength resolution is achieved by phase-shift interference effect or plasmonic enhancement printing structures. Continuous mode of operation will allow high throughput and low cost production.


We anticipate the technology will enable the next generation of advanced products, such as high efficiency 3D solar cells, building-integrated PVs, smart glass and superior quality coatings with anti- reflective, anti-glare, self-cleaning and anti-fog qualities, said Boris Kobrin, CEO and President of Rolith.


We are delighted to partner up with SÜSS MicroTec who is known for their world class designs and excellent customer service. With their 60 years of experience with optical lithography systems SÜSS


98 www.compoundsemiconductor.net November/December 2010


MicroTec has the necessary expertise and network to help Rolith to bring this much needed technology to market.


Our recent achievements with nanoimprint lithography systems have made us a leading expert for structuring substrates in MEMS and nano applications, stated Frank Averdung, President and CEO, SÜSS MicroTec AG. Combined with our flexible equipment solutions the novel optical nanolithography technology by Rolith has the potential to bring high volume nanoimprint technology to market by fundamentally changing the cost structure compared to current technologies.


MiaSolé Commercial-Scale CIGS Solar Modules Achieve 15.7% Efficiency


A square meter area of the firm’s thin film CIGS modules was verified to have 15.7% conversion efficiency by NREL.


MiaSolé, a leading manufacturer of copper indium gallium selenide (CIGS) thin-film photovoltaic solar panels, today announced that the U.S. Department of Energy’s National Renewable Energy Laboratory (NREL) independently confirmed the 15.7% efficiency of its large area production modules (1 square meter in size).


The 15.7 % module efficiency closely follows the previously announced 14.3% efficiency in September 2010. This is the highest efficiency demonstrated for commercial size thin-film modules and effectively closes the gap with polycrystalline silicon module efficiencies.


“This is a significant accomplishment as it represents the ability to manufacture full scale CIGS modules with efficiencies equal to or better than that of polycrystalline silicon modules available in the world today but manufactured at a thin- film cost structure. We are pleased that we are executing ahead of our roadmap for efficiency improvements and feel confident in our ability to bring high efficiency CIGS technology to the market place,’said Joseph Laia, CEO of MiaSolé.


MiaSolé has previously announced that it would start shipping its 13% efficiency modules in the second quarter of 2011 upon completion of UL and IEC certifications.


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