LEDs ♦ industry news
Air Products to Build Large- Scale Specialty Ammonia Plant
The world’s first on-site gas plant will supply ultra- high purity ammonia for LED manufacture in China.
Air Products has signed a contract with Anhui Sanan OptoElectronics to build two on-site ammonia (NH3) plants at Sanan’s new high brightness light emitting diode (LED) manufacturing facility in the Wuhu Economic and Technological Development Area, Anhui Province, China.
These new facilities, which will supply ammonia with state-of-the-art purity to Sanan OptoElectronics, will be the first and largest on-site specialty gas plants in the world.
Each plant Air Products is building will be capable of supplying 2,000 metric tons per year. Large volumes of NH3 are needed to provide the nitrogen source for the gallium nitride layers used in the manufacture of LEDs. Air Products currently supplies Sanan OptoElectronics’ two other LED facilities in China.
“We are pleased Sanan OptoElectronics chose Air Products for their high purity ammonia needs at Anhui,” said Corning Painter, vice president and general manager, Electronics, for Air Products. “At these volumes, Air Products is the only company providing ammonia with the purity at the source necessary for LED production.”
Air Products has a long history of building on- site industrial gas plants. In fact, the company pioneered the process in the 1940s. Since then, it has been building on-site facilities serving the refining, chemicals, steel and glass making industries around the world.
EVG’s New SMS-NIL Technology Achieves Ultra- High-Resolution Patterning
The firm’s Soft Molecular Scale Nanoimprint Lithography (SMS-NIL) technology can be used on patterning of features down to 12.5 nm.
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled a new technology capability that enables ultra-high-resolution patterning of features down to 12.5 nm: Soft Molecular Scale Nanoimprint Lithography (SMS-NIL).
Based on EVG’s proven UV-NIL systems, SMS- NIL provides customers with a repeatable, cost-effective process for producing ultra-high- resolution patterning on large-area surfaces. Using the new technology’s soft working stamp nanoimprint process, customers can perform full- area nanoimprints and optically aligned UV-NIL on existing EVG equipment. Likewise, the stamp and imprinting can be processed on the same tool without requiring additional processing steps saving customers significant processing time and money.
UV-NIL offers a significantly lower processing cost than other nano-patterning techniques, making it an attractive solution for CMOS image sensors, micro lens molding and other optical applications where the technology is already being used. SMS-NIL takes this approach a step further, employing soft polymeric working stamps to avoid damaging costly master stamps.
The stamp material’s inherent properties greatly reduce the risk of mechanical damage to master templates, thus extending their lifetime. The working stamps’ relatively low surface energy facilitates separation from the substrate after the imprinting process, while their flexibility allows the stamps to be used for multiple imprints.
Gerald Kreindl, product manager for nanoimprint lithography at EV Group, said, “For more than 10 years, we have maintained a strong technology focus on nanoimprint lithography and hot embossing. SMS-NIL is the culmination of our efforts to address customers’ challenges in this
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www.compoundsemiconductor.net November/December 2010
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