industry news ♦ LEDs
prohibitively high. The patented technology enables the formation of periodic nanostructures over large areas for such applications as LEDs, solar cells and flat-screen displays.
Nanoimprint method that is commonly employed for this purpose, it avoids contact between the mask and the wafer, and it does not require consumable soft-stamps.
Therefore an expensive two-step process is avoided. It is expected that other applications will also benefit greatly from this development, including nanowire-based LEDs and photovoltaic devices, heteroepitaxy on patterned silicon substrates and epitaxial lateral overgrowth (ELO) used in blue-ray lasers. Wire-grid polarizers, as required for both LCD displays and projectors, may also be produced with the PHABLE technology.
The new technology, dubbed PHABLE (for Photonics Enabler), is a mask based UV lithography. Unlike currently available technologies, the PHABLE system forms an image that has practically unlimited depth of focus.
The compatibility of PHABLE with conventional masks and UV- exposure processing will ensure a smooth adoption of PHABLE by the industry. Standard photoresists with suitable resolution and etch properties are available from multiple vendors. Therefore, HB-LED and other device manufacturers will be able to rely on the usual, well-established sources for obtaining the required consumable materials so as to ensure a low-cost manufacturing process for their photonic nanostructures.
Eulitha now offers samples and wafer batch processing services to companies and researchers developing nanostructure-based products who are interested in taking advantage of this breakthrough technology. It is also currently offering laboratory lithography tools for 2”-4” wafers that are suitable for product development.
Therefore non-flat substrates, such as LED wafers, can be patterned uniformly and reproducibly. It also allows combinations of different patterns such as linear diffraction gratings and arrays of holes on hexagonal or square grids to be printed using a single exposure onto a chip or a wafer.
The resolution of the printed features can be as small as one quarter of the illumination wavelength. The masks required by PHABLE can be produced inexpensively using standard chromium-on-quartz mask-writing technology.
Photonic crystals needed for enhancing the light extraction efficiency of LEDs is one of the major applications of the new technology. Unlike the
High-volume production tools with throughput in excess of 100 wafer-per-hour will be made available to manufacturers in the near future. Eulitha expects many future photonic devices to shine even brighter with the introduction of the PHABLE technology.
Eulitha is a spin-off company of the Paul Scherrer Institute, Switzerland. It specializes in the development of lithographic technologies for applications in photonics, biotech, patterned magnetic media and EUV optics. It produces and markets nano-patterned samples and templates using its unique EUV interference method and state-of-the-art e-beam lithography tools. PHABLE is the brand name of its new photolithography platform, which includes exposure tools and wafer patterning services.
November/December 2010
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