New Ion Probe for Next Generation FIB, SIMS, and
Nano-Ion Implantation
N. S. Smith
1
*, P. P. Tesch
1
, N. P. Martin
1
, and R. W. Boswell
2
1
Oregon Physics, 2704 SE 39th Loop, Suite 109, Hillsboro, Oregon 97123
2
Australian National University, Canberra, A.C.T.200, Australia
* n.smith@oregon-physics.com
Introduction
These “brightness” figures are more than an order of magnitude
Hyperion
TM
is a newly developed high-performance ion
higher than the duoplasmatron [3], which has been the most
source that significantly advances the capabilities of many ion
commonly used plasma source for high-performance, plasma-
beam techniques used by material scientists and engineers.
based focused ion beams. Furthermore, Hyperion has an
Hyperion has been developed to provide focused beams as
energy spread of only 5-6 eV, resulting in a figure-of-merit at
small as 10 nm, beam currents up to several micro-Amps, and a
the chromatic limit [10] that is approximately a factor of 50
broad range of ion species that include He
+
, O
+
higher than the workhorse duoplasmatron.
2
, Xe
+
and H
+
3
.
This technology provides state-of-the-art performance
Additionally, Hyperion has an angular intensity that is
in many areas of surface science and engineering that include
3 orders of magnitude higher than a liquid-metal ion source
FIB milling, nano implantation, and high-resolution surface
(LMIS). Compared to the LMIS FIB, this property translates
analysis. This paper summarizes a few applications that have
to a higher effective brightness (at the target) for Hyperion FIB
been explored with this new system, along with some of the
currents >30-40 nA at 30 keV. However, beam quality is often
enhanced capabilities that can be anticipated with future
quite poor with the LMIS FIB, even at beam currents of 20 nA
implementations.
due to the dominance of third-order geometric aberrations at
Hyperion is a high-density, non-thermal plasma ion source
large aperture angles [4]. Even with a perfectly aligned optical
that exhibits very high brightness, low energy spread and is able
column, the LMIS FIB spot shape exhibits an intense central
to operate reliably with inert and reactive plasma gases. [1, 2]
spot with long tails indicative of beams dominated by spherical
RF power is inductively coupled from an external antenna
blur.
to the boundary electrons of the plasma. The electrons are
FIB Milling
accelerated to sufficient energy to ionize resident gas molecules,
The high brightness (1x10
6
Am
-2
sr
-1
V
-1
), small virtual
however, conditions are maintained to ensure minimal ion
source size (50 nm), and low angular intensity (20 μA/sr)
heating and a static plasma
of the LMIS used in most FIB columns is advantageous for
potential. The Hyperion
forming high-resolution probes for small-volume milling but
plasma is remarkably
a significant disadvantage when beam currents in excess of
quiescent, allowing us to
20 nA are required. Although a 30 keV, gallium LMIS-FIB can
impart a very large power
form a spot size of ~200 nm with 20 nA, the beam tails will
density and thus create
a correspondingly high
plasma density without
compromising source
lifetime. Hyperion can
operate with a broad range
of inert and reactive plasma
gases, forming primarily
singly ionized atomic and
molecular ions.
This new source is now
providing useable beam
current that extends to many
micro-amps with an energy
normalized brightness of
>1x10
4
Am
-2
sr
-1
V
-1
with
xenon, 6.7x10
3
Am
-2
sr
-1
V
-1
with
helium, 4.5x10
3
Am
-2
sr
-1
V
-1

with oxygen, and 2.7x10
3

Figure 1: Hyperion plasma ion source Figure 2: RF induction coupling to plasma electrons.
Acm
-2
sr
-1
with hydrogen.
18 doi: 10.1017/S1551929509000315
www.microscopy-today.com • 2009 September
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